Annika joined Lam Research in 2017 and is currently Senior Technology Manager responsible for the Specialty Technologies application space. She previously held positions in engineering and program management, where she was partnering with our customers to enable future device generations.
In 2008 Annika received a B.Eng. in Mechatronics and Microsystems and a M.Sc. in Applied Physics in 2011. During her engineering thesis at Siemens AG, she worked on a high-speed laser scanning microscope for waver and bump inspection. In 2009 Annika joined a research group at the Institute of Micro Technologies, developing waveguides with integrated optics for bio-sensing, including hardware and process development for RF-sputtering, holographic lithography, and reactive ion etching. Prior to joining Lam Research Annika was part of the Technology Group at Oxford Instruments Plasma Technology, where she led multiple equipment and process developments in the field of atomic scale processing.
Advanced power semiconductors and PMICs are key enabling technologies in automotive, consumer and wireless communications. Si power semiconductors continue to evolve and are becoming increasingly sophisticated in order to deliver performance improvements. These trends are also driving the need for more advanced high volume manufacturing solutions. 300mm production, ultra-thin wafer processing, higher density device architecture and more complex vertical trench designs all pose new challenges from a fabrication perspective. At the same time, new generations of wide bandgap power devices that complement established Si based technologies are increasingly being deployed.Lam is partnering with our customers and research partners to continually innovate in these fields in order to offer market leading etch, deposition and clean solutions for advanced and next generation power device manufacturing.